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SURFACE AND INTERFACE ANALYSIS, VOL. 25, 481 (1997)
Preface
This proceedings volume contains a collection of papers presented at the
“2nd Workshop on Development and Industrial Application of Scanning
Probe Microscopy (SXM 2)Ï which was held on 16È18 September 1996 in
Vienna, Austria.
Following the Ðrst workshop held in October 1994 in MuŽnster,
Germany, the continued high interest in the SXM series was again documented by over 160 participants and 10 manufacturers who attended
SXM 2. During the 3 days of the workshop, a total of 52 oral contributions
and 30 posters were presented. Fifteen per cent of the contributions came
from industry. Six invited lecturers reported on subjects such as scanning
probe microscopy in semiconductor technology, STM on metals, true
atomic resolution with AFM, scanning force microscopy of polymers, nanotribological investigations with scanning force microscopy and high
resolution near-Ðeld optical microscopy. In general, the broad variety of
topics is also documented by the contributed papers, including up-to-date
instrumental developments from a variety of manufacturers.
The very positive response we have received for SXM 2 can be seen as a
clear vote for the continuation of this workshop series with SXM 3 which
will take place in 1998 in Basel, Switzerland. In this respect, the organizers
wish to thank all those who have contributed to a successful course of the
workshop. We are very conÐdent that it will continue to be successful in the
future and serve as a valuable forum for the European SXM community.
GERNOT FRIEDBACHER
Vienna University of Technology
HARALD FUCHS
University of MuŽnster
HANS-JOACHIM GUNTHERODT
University of Basel
( 1997 by John Wiley & Sons, Ltd.
SURFACE AND INTERFACE ANALYSIS, VOL. 25, 481 (1997)
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