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DESCRIPTION JPS58104178

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DESCRIPTION JPS58104178
[0001]
The present invention relates to a concentric electrodeposition suitable electrode deposition
method. For example, in a known ultrasonic microscope, as shown in FIG. 41, as a ultrasonic
transmitting and receiving element, one having a new set multi electrode structure in which
concentric multiple electrodes 2 are formed on the end face of a columnar acoustic element 1 is
used. However, conventionally, in such a transmitting and receiving element, the method and
method of the photocopying of forming the multiple electrode 2 on the acoustic element 1 are
often used. However, such photoaging requires a large amount of work to obtain multiple
electrodes, and this method is laborious and extremely troublesome. SUMMARY OF THE
INVENTION The present invention was made to eliminate the above-mentioned drawbacks, and it
is an object of the present invention to provide an electrode deposition method capable of
producing concentric multiple electrodes simply. Hereinafter, an embodiment of the present
invention will be described. In this case, in this embodiment, a method of depositing concentric
double electrodes of an ultrasonic transducer used in an ultrasonic microscope will be described.
First, a deposition mask 11 for producing a double electrode as shown in FIG. 2 is prepared. The
vapor deposition mask 11 has a circular slit 111 formed in the approximate center of the plate
surface, and a plurality of (three in the illustrated example) arcuate slits 112 with a
predetermined interval in the circumferential direction centering on the slit 111. It is formed.
Then, such a vapor deposition mask 11 is set on the electrode forming surface 121 of the
acoustic element 12 as shown in FIG. 3C. In this case, the acoustic element 12 is held by the
holder 13, and the center of the mask 11, that is, the center of the circular slit 111 coincides with
the center of the electrode formation ffi 121. From this state 1, the electrode formation surface
121 # electrode material of the acoustic element 12 such as gold is vacuum deposited through
the mask 11 once. As a result, an electrode pattern as shown in FIG. 4 (a) # is obtained. It is
necessary to prevent the center of the sleeve 11 from shifting. From this state, the electrode
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material is vacuum deposited again on the electrode forming surface 121 of the acoustic element
12. As a result, a concentric double electrode pattern as shown in FIG. 4 (b) is obtained.
Therefore, according to such a method, the mask is formed by using a deposition mask in which
a circular slit is formed and a plurality of circular arc slits are formed at predetermined intervals
in the circumferential direction centering on the slit. Since a concentric double electrode pattern
can be obtained only by setting once on the electrode formation surface of the element and
vaporizing once and rotating the mask or electrode formation surface again by a predetermined
angle relatively, a concentric double electrode pattern can be obtained The double electrode can
be made easily and in a short time as compared with such a photoaging method.
The present invention is not limited to the above-described embodiment, and various
modifications can be made without departing from the scope of the invention. For example, this
method can be applied to the production of a single pole which is used as a focusing means of
ultrasonic waves. In this case, as shown in FIG. 5, using the vapor deposition mask 3 in which a
plurality of arc-shaped slits 211 are formed at a predetermined interval in the circumferential
direction and C, this mask 21 is used as an electrode of the acoustic element as described above.
Formation 1: After setting on the surface and performing evaporation once, the center of the
mask does not shift-rubbing and repeating evaporation while rotating by a predetermined angle
on the mask or electrode formation surface: if: triple ring electrode It can be created. As
described above, according to the present invention, it is possible to provide an electrode
deposition method capable of easily forming concentric multiple electrodes.
[0002]
Brief description of the drawings
[0003]
Fig. 1 is a schematic configuration diagram for explaining an example of a general multiple
electrode structure, Fig. 2 is an embodiment of the present invention-a front view showing a
vapor deposition mask used, Fig. 3 'and @ 4 The figures (a) and (b) are explanatory views for
explaining the embodiment, and FIG. 5 'is a front view showing a vapor deposition mass used in
another example of this invention.
? ? 1 иии Acoustic element 2 иии Multiple electrodes 11, 21 ? ? и Mask 111 иии Slit 112 211 иии Arc
shaped slit 12 иии Acoustic element 121 иии Electrode formation @ 13 иии Holder 1
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