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JPS59222568

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DESCRIPTION JPS59222568
[0001]
The present invention relates to a method of manufacturing a gold FjS diaphragm such as a
speaker in an audio device. Heretofore, a metal diaphragm KVi for a speaker in an acoustic
device, and a lightweight and formable titanium foil are processed into a predetermined shape
and used. In a speaker composed of such a metal moving plate, a specific shooting mode occurs
in the entire diaphragm, and a peak occurs in the frequency characteristic of the high range,
which significantly impairs the sound quality C1 <sound quality. As a method of increasing the
specific modulus (the ratio of Young's modulus E to density ρ) to improve this property, a
process of coating a material having a high specific modulus is performed, and as a method of
processing it, Boron (Bl vapor deposition is employed. However, in this method, the adhesion
between the gold-plated diaphragm and the boron is poor, and there is a disadvantage such as
peeling during use. The present invention has been made to eliminate the above-mentioned
drawbacks of the prior art, and the diaphragm having a high specific modulus is manufactured
by ionizing the old fee having a high specific modulus and injecting it onto the surface of the
metal diaphragm. It is an object of the present invention to provide a method of manufacturing a
metal diaphragm capable of Hereinafter, an embodiment of the present invention will be
described with reference to the drawings. The figure is a cross sectional view showing the ion
implantation apparatus in one embodiment of the present invention. In the figure, (1) is a
substance to be ionized, +21 is a beak to heat the substance to be ionized (1), (3) is a heater ( 2)
furnace body containing the substance to be ionized (1), (4) a 6 tll temperature thermocouple
provided in the furnace body (3), (5) the substance to be ionized (1) to be ionized As described
above, the ion generation chamber provided above the furnace body (3), (6) is a cathode
provided on the furnace body (3) side of the ion generation chamber (5), (7) is a cathode (6)
Oppositely provided anodes. (8) Anode-supporting insulating rod supporting the phantom anode
(7), (9) is a magnet coil provided on the outer periphery of the ion generation chamber (5), (10)
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1
is the exit side of the ion generation chamber (5) The lead-out electrode (θ 1) provided on the
substrate is a metal diaphragm provided opposite to the lead-out electrode 101 and fixed to the
substrate a desired position. In order to perform ion implantation by the above-described ion
implantation apparatus, a substrate (gold, a diaphragm 0) formed into a predetermined shape is
attached to one substrate. Then, when a voltage of several hundreds to several thousands of n is
applied between the cathode (6) and the anode (7), a discharge occurs. ′ 'L L! , And the plasma
generated by is concentrated in the ion generation chamber (5) by the magnet coil (9). On the
other hand, the heated ionized substance (1) reacts with plasma in the ion generation chamber
(5) and can be ionized.
The ionized h-body is accelerated by the extraction electrode (lO) and injected into the metal
diaphragm 0 'fixed on the substrate 021. When the substance to be ionized is boron, ionization is
carried out using amorphous boron powder. In this case, when heated to a heater (21 ° to 1500
° C.), the vaporized boron gas enters the ion generation chamber (5). Cathode (6) provided in
the ion generation chamber (5), positive @ 1. (A DC voltage of f11500 V is applied during 、 to
generate plasma, which is centralized by the magnet coil (9) K, and the boron gas becomes boron
ions. The boron ions are accelerated to 5 kV from the extraction electrode (10), and are
implanted into the surface of the titanium metal diaphragm θ1). The degree of vacuum at this
time is 10'- 'Torr. According to the experiments, boron was ionized and ion implantation was
carried out for 1 hour on a titanium metal diaphragm, and as a result, the specific elastic
modulus was higher than 2.2 × 10 ′ ′ of titanium / 5 ec 2. OX108rr? It became 5ee2
and the acoustic characteristics were improved. In the above embodiment, although the metal
diaphragm is made of titanium, it may be titanium alloy, aluminum, aluminum alloy, magnesium
or magnesium alloy, and the same effect can be obtained. Also, although the case of boron was
shown as the substance to be ionized, other materials having a high specific elastic modulus may
be used depending on the material of the metal diaphragm. The method of ion implantation is
not limited to that shown in the drawings, but may be changed. As described above, according to
the present invention, since a material having a high specific elastic modulus is ionized and
injected into the surface of the metal diaphragm, Ix is formed, so that <NI does not occur and the
specific elastic modulus is not good. There is an effect that the diaphragm can be manufactured.
[0002]
Brief description of the drawings
[0003]
FIG. 1 is a cross-sectional view showing an ion implantation apparatus for a metal imaging plate
11-05-2019
2
according to an embodiment of the present invention.
In the figure, (1) is a substance to be ionized, (21 is a heater, (3) is a furnace body, (5) is an ion
chamber, (6) kJ, a cathode, (7) id: 1 bow 41 meters, 9) is a magnet coil, 00) is a lead electrode,
01) is a metal diaphragm, 02i is a substrate. Agent Oiwa Masuo
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